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PML2: The maskless multibeam solution for the 22nm node and beyond

 
: Klein, C.; Platzgummer, E.; Klikovits, J.; Piller, W.; Loeschner, H.; Bejdak, T.; Dolezel, P.; Kolarik, V.; Klingler, W.; Letzkus, F.; Butschke, J.; Irmscher, M.; Witt, M.; Pilz, W.; Jaschinsky, P.; Thrum, F.; Hohle, C.; Kretz, J.; Nogatch, J.T.; Zepka, A.

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Schellenberg, F.M. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Alternative lithographic technologies. Proceedings. Pt. 1 : 24 - 26 February 2009, San Jose, California, United States
Bellingham, WA: SPIE, 2009 (SPIE Proceedings 7271)
ISBN: 978-0-8194-7524-4
Art. 72710N
Conference on Alternative Lithographic Technologies <2009, San Jose/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer ISIT ()
Fraunhofer CNT ()

Abstract
Projection Mask-Less Lithography (PML2) is a potentially cost-effective multi electron-beam solution for the 22 nm half-pitch node and beyond. PML2 is targeted on using hundreds of thousands of individually addressable electron-beams working in parallel, thereby pushing the potential throughput into the wafers per hour regime. With resolution potential of < 10 nm, PML2 is designed to meet the requirements of several upcoming tool generations.

: http://publica.fraunhofer.de/dokumente/N-172286.html