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AFM characterization of large area micro-optical elements

: Oliva, M.; Benkenstein, T.; Flemming, M.; Zeitner, U.D.


Lehmann, P.H. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Europe, Cardiff:
Optical Measurement Systems for Industrial Inspection VI : 15-18 June 2009, Munich, Germany
Bellingham, WA: SPIE, 2009 (Proceedings of SPIE 7389)
ISBN: 978-0-8194-7672-2
Paper 73893K
Conference "Optical Measurement Systems for Industrial Inspection" <6, 2009, Munich>
Fraunhofer IOF ()

We discuss AFM (Atomic Force Microscopy) characterization in terms of critical dimension and depth for large area micro-optical elements. Results are shown and discussed in comparison with other techniques, such as SEM (Scanning Electron Microscopy) for CD measurements and FIB (Focused Ion Beam)-SEM characterization for the structure profile.