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Optics developments in the VUV-soft X-ray spectral region

: Feigl, T.; Heber, J.; Gatto, A.; Kaiser, N.


Nuclear instruments and methods in physics research, Section A. Accelerators, spectrometers, detectors and associated equipment 483 (2002), Nr.1-2, S.351-356
ISSN: 0167-5087
ISSN: 0168-9002
Fraunhofer IOF ()
optic development; VUV to soft X-ray spectral region; optical resolution; structure; technological innovation; electronic circuit; projection lithography; electromagnetic radiation; material aspect; design; controlled fabrication; multilayer coated optic; microlithography; microscopy; spectroscopy; soft X-ray laser; free-electron lasers; oxide; fluorides

The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the search for technological innovations and improvements. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. This paper covers some theoretical considerations, material aspects, design and different techniques of controlled fabrication of multilayer coated optics. Their potential applications for microlithography as well as alternative application fields like microscopy, spectroscopy, soft X-ray lasers and free electron lasers are also discussed.