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New microwave plasma sources for large scale applications up to atmospheric pressure

 
: Emmerich, R.; Kaiser, M.; Urban, H.; Graf, M.; Räuchle, E.; Elsner, P.; Feichtinger, J.; Schulz, A.; Walker, M.; Baumgärtner, K.-M.; Muegge, H.

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IEEE Nuclear and Plasma Sciences Society:
ICOPS 2002, 29th IEEE International Conference on Plasma Science. Conference record. Abstracts : Banff, Alberta, Canada, May 26 - 30, 2002
Piscataway: IEEE Operations Center, 2002
ISBN: 0-7803-7407-X
S.320
International Conference on Plasma Science (ICOPS) <29, 2002, Banff/Alberta>
Englisch
Abstract
Fraunhofer ICT ()

Abstract
Plasma technology is used in a wide field of applications for example for PECD-deposition, activation and etching. In particular microwave enhanced plasmas are very effective for activation of surfaces. Our objective targets are to construct plasma sources for large area application and plasma sources which can be used in a wide pressure regime as possible up to atmospheric pressure. In this presentation two sources for large area and wide pressure range plasma are discussed. They are based on a coaxial coupling of the magnetron and the antenna.

: http://publica.fraunhofer.de/dokumente/N-170355.html