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2008
Conference Paper
Titel
AlN/GaN-superlattice structures for the fabrication of intersubband detectors in the telecom wavelength range
Abstract
We report on the fabrication and characterization of GaN/AlN based superlattice structures with intersubband transition wavelengths in the optical telecom range. The devices consist typically of 40 periods of 1.5 nm thick Si-doped GaN wells and up to 15 nm thick AlN barriers. The photovoltaic mode of operation has allowed us to test these detectors at room temperature and for frequencies ranging into the multiple GHz region. Substantial performance improvements are expected if proper high frequency mounting and processing techniques will be used in the future.