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Manufacture of specific structure of aluminum-doped zinc oxide films by patterning the substrate surface

: Jiang, X.; Jia, C.L.; Szyszka, B.


Applied Physics Letters 80 (2002), Nr.17, S.3090-3092
ISSN: 0003-6951
ISSN: 1077-3118
Fraunhofer IST ()
magnetron sputtering technique; substrate surface; film thickness; texture formation; Si

(0001)-oriented aluminum-doped zinc oxide films were prepared using a magnetron sputtering technique. High-resolution transmission-electron- microscopic images show that the oriented grains nucleate directly on the substrate surface and grow with equal lateral dimensions through the film thickness. A surface-energy-driven self-texture mechanism was proposed on the basis of process modes. A method for manufacturing specific film structure by patterning the substrate surface is tested and discussed.