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Resist processes for high resolution mask and direct write applications using the latest vistec VSB electron column
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2007
Conference Paper
Titel
Resist processes for high resolution mask and direct write applications using the latest vistec VSB electron column
Author(s)
Sailer, H.
Irmscher, M.
Hohle, C.
Keil, K.
Boettcher, M.
Hahmann, P.
Hauptwerk
Microprocesses and nanotechnology 2007. Digest of papers
Konferenz
International Microprocesses and Nanotechnology Conference (MNC) 2007
DOI
10.1109/IMNC.2007.4456115
Language
English
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