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Millisecond flash lamp annealing of shallow implanted layers in Ge

: Wündisch, C.; Posselt, M.; Schmidt, B.; Heera, V.; Schumann, T.; Mücklich, A.; Grötzschel, R.; Skorupa, W.; Clarysse, T.; Simoen, E.; Hortenbach, H.


Applied Physics Letters 95 (2009), Nr.25, Art. 252107
ISSN: 0003-6951
ISSN: 1077-3118
Fraunhofer CNT ()

Shallow n+ layers in Ge are formed by phosphorus implantation and subsequent millisecond flash lamp annealing. Present investigations are focused on the dependence of P redistribution, diffusion and electrical activation on heat input into the sample and flash duration. In contrast to conventional annealing procedures an activation up to 6.5× 1019 cm-3 is achieved without any dopant redistribution and noticeable diffusion. Present results suggest that independently of pretreatment the maximum activation should be obtained at a flash energy that corresponds to the onset of P diffusion. The deactivation of P is explained qualitatively by mass action analysis which takes into account the formation of phosphorus-vacancy clusters.