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Instrument for close-to-process light scatter measurements of thin film coatings and substrates

 
: Finck, A. von; Hauptvogel, M.; Duparre, A.

:

Applied optics 50 (2011), Nr.9, S.C321-C328
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Englisch
Zeitschriftenaufsatz
Fraunhofer IOF ()

Abstract
Scatter analysis is an effective method for the characterization of thin film components. The new highly sensitive table top system ALBATROSS-TT (3D-Arrangement for Laser Based Transmittance, Reflectance and Optical Scatter Measurement-Table Top) has been developed at the Fraunhofer Institute in Jena to meet the specific requirements for close-to-process applications. Extremely high sensitivity with a noise equivalent angle resolved scatter level of 2 x 10(-8) sr(-1), full three-dimensional spherical measurement capability, and an instrument size as small as 0.8 m x 0.8 m x 0.8 m have been achieved. Details of specifications, optical components, and software are presented, including a comparison to our laboratory system. Anisotropy analysis of diamond-turned aluminum substrates as well as substrate and coating characterization are demonstrated as examples of application.

: http://publica.fraunhofer.de/dokumente/N-161064.html