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Changes in contact resistance of different metals to magnetron sputtered ITO while annealing

: Ziegler, J.; Xia, L.; Zejnelovic, R.; Borchert, D.

Volltext urn:nbn:de:0011-n-1594928 (171 KByte PDF)
MD5 Fingerprint: bf246291f7d18a267313e005950a1c26
Erstellt am: 20.12.2014

European Commission:
25th European Photovoltaic Solar Energy Conference and Exhibition, EU PVSEC 2010. Proceedings : 5th World Conference on Photovoltaic Energy Conversion, 6-10 , September 2010, Valencia, Spain
München: WIP-Renewable Energies, 2010
ISBN: 3-936338-26-4
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <25, 2010, Valencia>
World Conference on Photovoltaic Energy Conversion <5, 2010, Valencia>
Konferenzbeitrag, Elektronische Publikation
Fraunhofer ISE ()
PV Produktionstechnologie und Qualitätssicherung; Silicium-Photovoltaik; Pilotherstellung von industrienahen Solarzellen; Industrielle und neuartige Solarzellenstrukturen

In this work we compare the contact formation of silver, aluminium, chrome, titanium, nickel, palladium, and copper on magnetron sputtered indium tin oxide (ITO) and the change of the contact resistance during a low temperature annealing step. Test structures after Schroder and Meier were prepared to measure the sheet resistance of the ITO layers on glass, as well as the specific contact resistance between ITO and the metal. We saw for all metals besides aluminium no significant changes in the contact resistance after annealing. The sheet resistances of the ITO layers changed after the annealing depending on the base pressure before starting the sputter process. No significant changes in the optical properties of the ITO layers could be observed.