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Gasflusssputterquelle

Gas flow sputter source has hollow cathode with inlet opening and outlet opening for inert gas, where housing is attached in area of outlet opening at hollow cathode
 
: Jung, T.

:
Frontpage ()

DE 102009037853 A: 20090818
DE 102009037853 A: 20090818
H05H0001
C23C0014
Deutsch
Patent, Elektronische Publikation
Fraunhofer IST ()

Abstract
(B3) Die vorliegende Erfindung betrifft eine Gasflusssputterquelle, die eine Hohlkathode mit einer Eintritts- und Austrittsoeffnung fuer Inertgas aufweist, wobei im Bereich der Austrittsoeffnung der Hohlkathode ein Gehaeuse mit einer Ausnehmung angeordnet ist.

 

EP 2287884 A2 UPAB: 20110307 NOVELTY - The gas flow sputter source has a hollow cathode (2) with an inlet opening and an outlet opening for inert gas. A housing (7) is attached in the area of the outlet opening at the hollow cathode. The housing has a recess, whose width amounts to 80 percent of the width of the outlet opening. The side of the housing facing the hollow cathode has a curved surface. The housing is made of steel alloys or aluminum. USE - Gas flow sputter source. ADVANTAGE - The gas flow sputter source has a hollow cathode with an inlet opening and an outlet opening for inert gas, where a housing is attached in the area of the outlet opening at the hollow cathode, and hence ensures long-term operation of the gas flow sputter source without impairment of the layer quality, the coating rate and process stability.

: http://publica.fraunhofer.de/dokumente/N-159153.html