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Fuzzy end point detection for liquid etching processes

: Knobloch, J.; Koch, M.

Hamza, M.H. ; International Association of Science and Technology for Development -IASTED-:
Control and applications. Proceedings of the IASTED International Conference 2000
Anaheim: IASTED/ACTA Press, 2000
ISBN: 0-88986-288-5
S.56-60 : Lit.
International Conference Control and Applications <2000, Cancún>
Fraunhofer IMS, Außenstelle Dresden ( IPMS) ()
Fuzzy control; end-point detection; Halbleiterausrüstung; Bildverarbeitung

To determine the exact duration of liquid etching processes on spin-etchers an add-on device was developed which analyses optical properties of the wafer surface through a camera. The image processing is performed on normal PC hardware. A modular software structure is described, and the results of applying fuzzy methods in various parts of the algorithm are presented.