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Plasma single-sided etching for rear emitter etch-back and flattening of industrial crystalline silicon solar cells

 
: Khandelwal, R.; Hofmann, M.; Trogus, D.; Gautero, L.; Seiffe, J.; Rentsch, J.; Preu, R.

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Volltext urn:nbn:de:0011-n-1564311 (489 KByte PDF)
MD5 Fingerprint: 76899f2c470b3f4dc25e6c59a596dd26
Erstellt am: 9.8.2012


European Commission:
25th European Photovoltaic Solar Energy Conference and Exhibition, EU PVSEC 2010. Proceedings : 5th World Conference on Photovoltaic Energy Conversion, 6-10 , September 2010, Valencia, Spain
München: WIP-Renewable Energies, 2010
ISBN: 3-936338-26-4
S.2667-2671
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <25, 2010, Valencia>
World Conference on Photovoltaic Energy Conversion <5, 2010, Valencia>
Englisch
Konferenzbeitrag, Elektronische Publikation
Fraunhofer ISE ()
PV Produktionstechnologie und Qualitätssicherung; Silicium-Photovoltaik; Pilotherstellung von industrienahen Solarzellen; Messtechnik und Produktionskontrolle; Industrielle und neuartige Solarzellenstrukturen; Produktionsanlagen und Prozessentwicklung

Abstract
In this paper, we present investigations on single-sided plasma etching for silicon wafers with work aimed for the development, characterization and application of single-sided plasma etching processes for industrial silicon solar cells. Tests were conducted using a popular industrial inline plasma system from Roth&Rau (modified SiNA). For high-efficiency cell structures with passivated and locally contacted rear side; it is beneficial to prepare a polished/flat rear surface to achieve a very good quality of passivation. During this work different dry etching approaches (using SF6- and O2-based plasma chemistry) for the solar cells rear, have been investigated in terms of resulting surface topography and optical performance. Solar cells processed with the developed plasma etching steps (for front and rear surface) exceeding 17% efficiency are reported in this study. The investigated process can be adapted to fit in the workflow for PERC-type (passivated emitter and rear cell) high-efficiency solar cell structures.

: http://publica.fraunhofer.de/dokumente/N-156431.html