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Plasma texturing of thin film solar cells

: Keller, M.; Janz, S.; Reber, S.; Lindekugel, S.

Volltext urn:nbn:de:0011-n-1564304 (509 KByte PDF)
MD5 Fingerprint: bd673586e7e4fe1cc72cd32136c55503
Erstellt am: 10.8.2012

European Commission:
25th European Photovoltaic Solar Energy Conference and Exhibition, EU PVSEC 2010. Proceedings : 5th World Conference on Photovoltaic Energy Conversion, 6-10 , September 2010, Valencia, Spain
München: WIP-Renewable Energies, 2010
ISBN: 3-936338-26-4
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <25, 2010, Valencia>
World Conference on Photovoltaic Energy Conversion <5, 2010, Valencia>
Konferenzbeitrag, Elektronische Publikation
Fraunhofer ISE ()

A potentially inexpensive way to texture silicon surfaces especially for crystalline silicon thin-film solar cells is the plasma texturing method. This method uses the principle of self-masking and is realised at Fraunhofer ISE using an isotropic and an anisotropic power supply. Even in continuous in-line processing, the process allows a conditioning of the wafer surface in a wide range. In this paper two scientific problems are addressed: first, simulations were performed to find the best texture geometry for a multi crystalline thin film solar cell and second, experimental work was done to develop the exact parameter set for the self masking plasma etching. By this work, we were able to identify good processes for powerful textures.