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Light-scattering measurements of optical thin-film components at 157 and 193 nm

: Gliech, S.; Steinert, J.; Duparre, A.


Applied optics 41 (2002), Nr.16, S.3224-3235
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Fraunhofer IOF ()
scattering measurement; Instrumentation; measurement; metrology; optics at surface; roughness; physical optic; ultraviolet; thin film; coating

An instrument for total backscattering and forward-scattering measurements of optical coating components at 157 and 193 nm is described. The system is operated in both vacuum and nitrogen purge gas. An excimer laser as well as a deuterium lamp can be used as a radiation source. Suppression of the background signal level to 1 part in 106 permits measurements even of low-scatter samples such as superpolished substrates and antireflection coatings. Results of investigations of antireflective and highly reflective multilayers and CaF2 substrates reveal scattering from surface and interface roughness as well as from the volume of the substrate material. First steps to extend the instrument for angle-resolved scatter, transmittance, and reflectance measurements are described.