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Spectroscopic ellipsometry study of thin diffusion barriers of TaN and Ta for Cu interconnects in integrated circuits
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2008
Conference Paper
Titel
Spectroscopic ellipsometry study of thin diffusion barriers of TaN and Ta for Cu interconnects in integrated circuits
Author(s)
Baum, M.
Letsch, H.
Shaporin, A.V.
Otto, T.
Gessner, T.
Hauptwerk
Papers presented at the 4th International Conference on Spectroscopic Ellipsometry, ICSE4
Konferenz
International Conference on Spectroscopic Ellipsometry (ICSE) 2007
Language
English
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Fraunhofer-Institut für Elektronische Nanosysteme ENAS
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM