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Electrical characterization and reliability of nitrided-gate insulators for N- and P-type 4H-SiC MIS devices

: Noborio, M.; Grieb, M.; Bauer, A.J.; Peters, D.; Friedrichs, P.; Suda, J.; Kimoto, T.


Bauer, A.J.; Friedrichs, P.; Krieger, M.; Pensl, G.; Rupp, R.; Seyller, T.:
Silicon carbide and related materials 2009 : Selected, peer reviewed papers from the International Conference on Silicon Carbide and Related Materials 2009, Nürnberg, Germany, October 11 - 16, 2009
Stafa-Zürich: Trans Tech Publications, 2010 (Materials Science Forum 645/648)
ISBN: 978-0-87849-279-4
ISBN: 0-87849-279-8
International Conference on Silicon Carbide and Related Materials (ICSCRM) <13, 2009, Nürnberg>
Fraunhofer IISB ()
MIS; MOS; MISFET; MOSFET; interface state density; channel mobility; charge-to-breakdown; TDDB; deposited oxide; SiNx; N2O; nitridation

In this paper, nitrided insulators such as N2O-grown oxides, deposited SiO2 annealed in N2O, and deposited SiNx/SiO2 annealed in N2O on thin-thermal oxides have been investigated for realization of high performance n- and p-type 4H-SiC MIS devices. The MIS capacitors were utilized to evaluate MIS interface characteristics and the insulator reliability. The channel mobility was determined by using the characteristics of planar MISFETs. Although the N2O-grown oxides are superior to the dry O2-grown oxides, the deposited SiO2 and the deposited SiNx/SiO2 exhibited lower interface state density (n-MIS: below 7x1011 cm-2eV-1 at EC-0.2 eV, p-MIS: below 6x1011 cm-2eV-1 at EV+0.2 eV) and higher channel mobility (n-MIS: over 25 cm2/Vs, p-MIS: over 10 cm2/Vs). In terms of reliability, the deposited SiO2 annealed in N2O exhibits a high charge-to-breakdown over 50 C/cm2 at room temperature and 15 C/cm2 at 200°C. The nitrided-gate insulators formed by deposition method have superior characteristics than the thermal oxides grown in N2O.