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Title
Verfahren zum Erzeugen eines Plasmas mittels eines Magnetrons
Date Issued
2009
Author(s)
Fietzke, F.
Klostermann, H.
Krätzschmar, B.-G.
Blüthner, R.
Patent No
102009019422
Abstract
(A1) Die Erfindung betrifft ein Verfahren zum Erzeugen eines Plasmas mittels mindestens eines Magnetrons, wobei dem Magnetron die elektrische Energie von Pulsen (elektrische Pulse) zugefuehrt und somit die Staerke des eine Magnetron-Entladung aufrechterhaltenden elektrischen Feldes mit einer ersten Frequenz veraendert wird und wobei die Staerke eines das Magnetron durchdringenden Magnetfeldes mit einer zweiten Frequenz veraendert wird. Dabei wird die zweite Frequenz in einem Bereich von 0,1 Hz bis 1 kHz eingestellt; die maximale Staerke des Magnetfeldes mindestens fuenfmal hoeher eingestellt als die durchschnittliche Staerke des Magnetfeldes und die erste Frequenz mindstens zehnmal hoeher als die zweite Frequenz eingestellt.
DE 102009019422 A1 UPAB: 20101117 NOVELTY - The method comprises supplying an electrical energy in the form of pulses to a magnetron, changing the strength of an electric field maintaining a magnetron discharge with a first frequency, changing the strength of a magnetic field penetrating through the magnetron with a second frequency, adjusting the second frequency to 1-100 Hz, adjusting the maximum strength of the magnetic field to 5-times higher than the average strength of the magnetic field, and adjusting the first frequency to 100-times higher than the second frequency. A magnetron discharge voltage is generated by 200-2000 V. DETAILED DESCRIPTION - The method comprises supplying an electrical energy in the form of pulses to a magnetron, changing the strength of an electric field maintaining a magnetron discharge with a first frequency, changing the strength of a magnetic field penetrating through the magnetron with a second frequency, adjusting the second frequency to 1-100 Hz, adjusting the maximum strength of the magnetic field to 5-times higher than the average strength of the magnetic field, and adjusting the first frequency to 100-times higher than the second frequency. A magnetron discharge voltage is generated by 200-2000 V. The first frequency is increased to such an extent until during a rising edge of the magnetic field strength, a further electrical pulse is generated later after the ignition of a plasma when the value of the physical parameter characterizing the intensity of the plasma is dropped to 2% of its maximum value obtained during the previous electrical pulse. The magnetic field is periodically pulsed, in which a magnetic coil is subjected with a pulsed electric voltage, where the pulse-in-time is adjusted to 5-500 mu s in the electric pulses. USE - Method for generating plasma using magnetron useful during magnetron sputtering, plasma etching or magnetron-plasma-enhanced chemical vapor deposition-processes. ADVANTAGE - The method is capable of continuously and effectively generating the plasma with high degree of ionization and less technical effort.
Language
de
Patenprio
DE 102009019422 A: 20090429