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Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range

: Procop, M.; Radtke, M.; Krumrey, M.; Hasche, K.; Schädlich, S.; Frank, W.


Analytical and bioanalytical chemistry 374 (2002), Nr.4, S.631-634
ISSN: 1618-2642 (Print)
ISSN: 1618-2650 (Online)
Fraunhofer IWS ()
electron probe microanalysis; EPMA; thin film; thickness measurement; x-ray; mechanische Schicht-Charakterisierung

The thickness of thin films of platinum and nickel on fused silica and silicon substrates has been determined by EPMA using the commercial software STRATAGEM for calculation of film thickness. Film thickness ranged in the order 10 nm. An attempt was made to estimate the confidence range of the method by comparison with results from other methods of analysis. The data show that in addition to the uncertainty of the spectral intensity measurement and the complicated fitting routine, systematic deviation caused by the underlying model should be added. The scattering in the results from other methods does not enable specification of a range of uncertainty, but deviations from the real thickness are estimated to be less than 20%.