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Beschichtungsanlage und -verfahren

Coating plant comprises an evacuatable recipient for the reception of a substrate, a gas supply device by which a gaseous precursor is introduced in the recipient, and an activation device, which consists of a heatable activation element
 
: Schäfer, L.; Harig, T.; Höfer, M.; Laukart, A.; Armgardt, M.

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DE 102009023467 A: 20090602
DE 102009023467 A: 20090602
C23C0016
Deutsch
Patent, Elektronische Publikation
Fraunhofer IST ()

Abstract
(A1) Die Erfindung betrifft eine Beschichtungsanlage, enthaltend zumindest einen evakuierbaren Rezipienten, welcher zur Aufnahme eines Substrates vorgesehen ist, zumindest eine Gaszufuhreinrichtung, mittels welcher zumindest ein gasfoermiger Prekursor in den Rezipienten einleitbar ist, und zumindest eine Aktivierungseinrichtung, welche zumindest ein beheizbares Aktivierungselement enthaelt, dessen Ende an einer Befestigungsstelle an einem Halteelement befestigt ist, wobei das Aktivierungselement mit zumindest einer ersten Heizeinrichtung und zumindest einer zweiten Heizeinrichtung beheizbar ist und mit der ersten Heizeinrichtung ein ueber die Laengserstreckung des Aktivierungselementes gleichmaessiger Energieeintrag bewirkbar ist und mit der zweiten Heizeinrichtung ein ueber die Laengserstreckung des Aktivierungselementes variierender Energieeintrag bewirkbar ist. Weiterhin betrifft die Erfindung ein korrespondierendes Beschichtungsverfahren.

 

DE 102009023467 A1 UPAB: 20101216 NOVELTY - The coating plant comprises an evacuatable recipient (10) for the reception of a substrate (30), a gas supply device (20, 21, 22) by which a gaseous precursor is introduced in the recipient, and an activation device (40), which consists of a heatable activation element (41), whose end is mounted on a mounting position to a holding element. The activation element is heatable with a first heating unit and a second heating unit, where an energy transfer uniformly over the longitudinal stretching of the activation element is ensured. DETAILED DESCRIPTION - The coating plant comprises an evacuatable recipient (10) for the reception of a substrate (30), a gas supply device (20, 21, 22) by which a gaseous precursor is introduced in the recipient, and an activation device (40), which consists of a heatable activation element (41), whose end is mounted on a mounting position to a holding element. The activation element is heatable with a first heating unit and a second heating unit, where an energy transfer uniformly over the longitudinal stretching of the activation element is ensured and an energy transfer variable over the longitudinal stretching of the activation element is ensured. The first heating unit comprises a resistance heating. The energy transfer of the second heating unit is terminable on an area of the activation element at the mounting position so that the heat removal is compensated over the holding element. The second heating unit is directed to ensure an energy entry in the holding element. The second heating unit is directed to bring radiation energy in the activation element and/or the holding element and comprises an arrangement for producing a particle beam, an arrangement for producing plasma, an arrangement for producing electric and/or magnetic alternating field, and a control unit, which provides a temperature-actual value external of the effective area of the second heating unit. An INDEPENDENT CLAIM is included for a method for producing a coating of a substrate. USE - Coating plant useful for coating a substrate. ADVANTAGE - The coating plant increases the process stability, simplifies the process control and ensures the coating of the substrate with good quality and with less consumption of energy.

: http://publica.fraunhofer.de/dokumente/N-148684.html