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Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputtering

: Szyszka, B.; Sittinger, V.; Jiang, X.; Hong, R.J.; Werner, W.; Pflug, A.; Ruske, M.; Lopp, A.

Klages, C.-P.; Gläser, H.J. ; Fraunhofer-Institut für Schicht- und Oberflächentechnik -IST-, Braunschweig; Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik -FEP-, Dresden:
4th International Conference on Coatings on Glass 2002. Proceedings : Advanced Coatings on Glass & Plastics for Large-Area High-Volume Products, November 3 - November 7, 2002, Braunschweig, Germany
Braunschweig, 2002
International Conference on Coatings on Glass (ICCG) <4, 2002, Braunschweig>
Fraunhofer IST ()

A new coating technology has been developed for large area deposition of transparent and conductive ZnO:Al films. Reactive AC magnetron sputtering from metallic Zn:Al has been performed at low substrate temperature below 200 °C using the new CleanMagTM technology of Applied Films based on moving magnets for layers with low defect density and with conventional reactive AC magnetron sputtering using static magnets (Applied Films TwinMagTM). Process stabilization at non-stable process conditions in transition mode has been achieved using closed loop control of discharge power according to fast oxygen partial pressure measurements taken by a lambda probe. Films with film thickness of 800 ... 1000 nm deposited with dynamic deposition rate of aD > 60 nm m/min exhibit low resistivity of p < 270 µWcm and small absorption (k > 2 x 10-3) in the visible range. The homogeneity of sheet resistance on float glass substrates with dimension of 600 x 1000 mm² is better than + 6 %. Film properties such as etching characteristics and haze can be controlled due to adjustment of total pressure and substrate temperature for large area a-Si:H thin film photovoltaic applications.