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1996
Journal Article
Titel
Modification of field emitter array tip shape by focused ion-beam irradiation
Abstract
Tip shapes of Si field emitter arrays, fabricated by a conventional dry etching process, have been modified by focused ion-beam (FIB) irradiation to obtain a sharp cone shape. Flat-topped Si tips could be sharpened by localized sputtering using FIBs for a short time. Tip shape inspections and repairs were also performed using a FIB system combined with an electron-beam column to remove metal residues and melted emitters.