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Properties of TiO2 films deposited by bipolar reactive HiPIMS

 
: Vergöhl, M.; Bruns, S.

Kondruweit, S.; Szyszka, B.; Pütz, J. ; Fraunhofer-Institut für Schicht- und Oberflächentechnik -IST-, Braunschweig:
8th International Conference on Coatings on Glass and Plastics, ICCG 2010. Advanced Coatings for Large Area or High-Volume Products. Proceedings : June 13-17, 2010, Braunschweig, Germany
Braunschweig: IST, 2010
ISBN: 978-3-00-031387-5
S.301-305
International Conference on Coatings on Glass and Plastics (ICCG) <8, 2010, Braunschweig>
Englisch
Konferenzbeitrag
Fraunhofer IST ()
high power impulse magnetron sputtering; titanium dioxide; optical property; partial pressure control

Abstract
TiO2 films are deposited with partial pressure controlled bipolar high power impulse magnetron sputtering (HiPIMS) sputtering. By the reduction and control of the oxygen partial pressure, the deposition rate could be increased by a factor of 3 compared to the oxide mode. A high index of refraction (n> 2.6 at 550 nm) formerly observed in transition mode at higher deposition rates. The high refractive index in also is agreement with XRD measurements, which shows a pronounced rutile phase. An increased absorption is also observed by optical analysis.

: http://publica.fraunhofer.de/dokumente/N-141265.html