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Advanced mask aligner lithography: Fabrication of periodic patterns using pinhole array mask and Talbot effect

 
: Stürzebecher, L.; Harzendorf, T.; Vogler, U.; Zeitner, U.D.; Völkel, R.

:
Postprint (1.5 MByte; PDF; )

Optics Express 18 (2010), Nr.19, S.19485-19494
ISSN: 1094-4087
Englisch
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer IOF ()

Abstract
The Talbot effect is utilized for micro-fabrication of periodic microstructures via proximity lithography in a mask aligner. A novel illumination system, referred to as MO Exposure Optics, allows to control the effective source shape and accordingly the angular spectrum of the illumination light. Pinhole array photomasks are employed to generate periodic high-resolution diffraction patterns by means of self-imaging. They create a demagnified image of the effective source geometry in their diffraction pattern which is printed to photoresist. The proposed method comprises high flexibility and sub-micron resolution at large proximity gaps. Various periodic structures have been generated and are presented.

: http://publica.fraunhofer.de/dokumente/N-140689.html