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1987
Conference Paper
Titel
Plasma mass spectrometric analysis and control of reactive ion etching of InP and related compounds
Abstract
The authors report on the investigation of mechanisms involved in the reactive ion etching of InP and related compounds by in situ determination of plasma species using mass spectroscopy. Gas phase and surface reactions can be distinguished by different neutral and ionic products. A correlation between the etching rate of InP and the amount of production formation is obtained.
Language
English