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1991
Conference Paper
Titel
E-beam lithography for the microfabrication of OEICs
Abstract
The authors demonstrate the use of e-beam direct write lithography for the microfabrication of optoelectronic integrated circuits (OEICs). Special design tools were developed for waveguide structures to enhance CAD and lithographic performance. Besides high resolution applications (e.g. gratings), e-beam lithography was used for three-dimensional resist shaping in order to develop waveguide tapers.
Konferenz
Language
English