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E-beam lithography for the microfabrication of OEICs

 
: Engel, H.; Doldissen, W.

Scheggi, A.M. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.; European Physical Society -EPS-, Geneva; West European Optical Societies:
Micro-optics II. Proceedings
Bellingham/Wash.: SPIE, 1991 (SPIE Proceedings Series 1506)
ISBN: 0-8194-0615-5
S.60-64
European Congress on Optics (ECO) <4, 1991, The Hague>
Englisch
Konferenzbeitrag
Fraunhofer HHI ()
electron beam lithography; integrated optoelectronics; optical waveguides; optical workshop techniques; optoelectronic integrated circuits; waveguide structures; cad; high resolution applications; gratings; three-dimensional resist shaping; waveguide tapers

Abstract
The authors demonstrate the use of e-beam direct write lithography for the microfabrication of optoelectronic integrated circuits (OEICs). Special design tools were developed for waveguide structures to enhance CAD and lithographic performance. Besides high resolution applications (e.g. gratings), e-beam lithography was used for three-dimensional resist shaping in order to develop waveguide tapers.

: http://publica.fraunhofer.de/dokumente/N-13683.html