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Smart technology for blazed multilevel gratings in resonance domain

 
: Oliva, M.; Benkenstein, T.; Dunkel, J.; Harzendorf, T.; Matthes, A.; Michaelis, D.; Zeitner, U.D.

:

Thienpont, H. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Micro-Optics 2010 : 12.-16.4.2010, Brussels, Belgium
Bellingham, WA: SPIE, 2010 (Proceedings of SPIE 7716)
ISBN: 978-0-8194-8189-4
Paper 77161L
Conferecne "Micro-Optics" <2010, Brussels>
Englisch
Konferenzbeitrag
Fraunhofer IOF ()
blazed gratings; multi level elements; electron-beam lithography

Abstract
The design and the fabrication of a multilevel blazed grating in resonance domain for first order high efficiency applications are presented. The design shows that a 3 phase level grating is sufficient to achieve efficiency of 90% in the minus first diffraction order. The standard technology for the fabrication of multilevel grating consists in multistep electron beam lithography and reactive ion beam etching of the grating profile into the fused silica substrate. Typical fabrication errors of this technology approach, e.g. misalignment, reduce the theoretical reachable efficiency of the grating. Two new technological approaches were investigated to avoid these typical fabrication errors and to improve the multi level fabrication process. The designed grating has been fabricated by three different technological solutions and the geometrical characterization as well as the diffraction performance are presented and discussed.

: http://publica.fraunhofer.de/dokumente/N-134280.html