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Multilevel diffractive optical elements fabricated with a single amplitude-phase mask

 
: Pawlowski, E.; Engel, H.

:

Journal of the European Optical Society. Part A, Pure and applied optics 6 (1997), Nr.6, S.655-62
ISSN: 0963-9659
Englisch
Zeitschriftenaufsatz
Fraunhofer HHI ()
etching; lenses; masks; optical elements; optical fabrication; optical testing; photolithography; zone plates; multilevel diffractive optical elements; single amplitude-phase mask; fabrication process; fabrication techniques; optical lithography step; dry-etching process; lateral structures; optical performance; diffraction efficiencies; 90 percent; 180 nm

Abstract
To simplify the fabrication process of multilevel diffractive optical elements a new fabrication technique is presented. The fabrication process is based on a single optical lithography step and a subsequent dry-etching process. Lateral structures with dimensions of 180 nm were transferred. The fabricated diffractive optical elements show high optical performance with diffraction efficiencies of over 90%.

: http://publica.fraunhofer.de/dokumente/N-13180.html