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Micro-optical elements fabricated by electron-beam lithography and dry etching technique using top conductive coatings

 
: Steingrüber, R.; Ferstl, M.; Pilz, W.

:

Microelectronic engineering 57-58 (2001), S.285-289
ISSN: 0167-9317
International Conference on Micro- and Nano-Engineering <26, 2000, Jena>
Englisch
Konferenzbeitrag, Zeitschriftenaufsatz
Fraunhofer HHI ()
Fraunhofer ISIT ()
electron beam lithography; micro-optics; optical fabrication; optical films; sputter etching; micro-optical element; fabrication; dry etching; top conductive coating; charging effects; dielectric substrate; resist

Abstract
The fabrication of micro-optical elements by electron-beam lithography and dry etching technique using a top conductive coating is presented. This conductive layer prevents the occurrence of charging effects during electron-beam exposure. Several different structures, mainly for use in micro-optics using various resist types, were realised in dielectric substrates. The use of top conductive coatings proved to be practical, reliable and simple.

: http://publica.fraunhofer.de/dokumente/N-12902.html