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Verfahren zur Herstellung einer transparenten und leitfaehigen Metalloxidschicht durch gepulstes, hochionisierendes Magnetronsputtern

Method for the production of transparent and conductive metal oxide layer on substrate, comprises spraying a component of metal oxide layer through highly ionized, pulsed high-power magnetron sputtering and then condensing on the substrate
 
: Horstmann, F.; Sittinger, V.; Szyszka, B.

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Frontpage ()

DE 102008028140 A: 20080613
DE 102008028140 A: 20080613
C23C0014
C03C0017
Deutsch
Patent, Elektronische Publikation
Fraunhofer IST ()

Abstract
Die Erfindung betrifft ein Verfahren zur Herstellung einer transparenten und leitfähigen Metalloxidschicht auf einem Substrat, bei dem zumindest ein Bestandteil der Metalloxidschicht durch hochionisierendes, gepulstes Hochleistungsmagnetronsputtern zerstäubt wird und auf dem Substrat kondensiert, wobei - die Pulse des Magnetrons eine Peakleistungsdichte aufweisen, die grösser als 1,5 kW/cm2 ist, - die Pulse des Magnetrons eine Zeitdauer haben, die <= 200 [mu]s ist, sowie - der mittlere Stromflussdichteanstieg beim Zünden des Plasmas innerhalb eines Zeitintervalls, das 2) beträgt.

 

DE 102008028140 B3 UPAB: 20091222 NOVELTY - The method comprises spraying a component of metal oxide layer through highly ionized, pulsed high-power magnetron sputtering and then condensing on a substrate. The pulse of the magnetron has a peak power density that is greater than 3.0 kW/cm2, a time duration of less than or equal to 35 mu s, and a frequency of 350 Hz to 2 kHz. The average current flow density gradient is 106 A/(ms cm2) during igniting the plasma within a time interval of less than or equal to 0.025 ms. A ceramic target is sprayed for the production of metal oxide layer. DETAILED DESCRIPTION - The method comprises spraying a component of metal oxide layer through highly ionized, pulsed high-power magnetron sputtering and then condensing on a substrate. The pulse of the magnetron has a peak power density that is greater than 3.0 kW/cm2, a time duration of less than or equal to 35 mu s, and a frequency of 350 Hz to 2 kHz. The average current flow density gradient is 106 A/(ms cm2) during igniting the plasma within a time interval of less than or equal to 0.025 ms. A ceramic target is sprayed for the production of metal oxide layer. A metallic target is sprayed in a reactive gas process under addition of oxygen for the production of metal oxide layer. The temperature in which the substrate is coated with the metal oxide is less than 100 degrees C. The metal oxide layer is produced with a fine crystalline structure, whose lateral and vertical grain size is less than 35 nm. The substrate is tempered with a metal oxide layer in a further process step. The metal oxide layer retains its crystallinity and/or the crystallite size after tempering. The crystallite size change is less than 10% after the tempering. The magnetron is operated without arc discharge-handling. USE - Method for the production of transparent and conductive metal oxide layer on substrate. ADVANTAGE - The method ensures efficient production of transparent and conductive metal oxide layer on substrate with good mechanical and optical properties.

: http://publica.fraunhofer.de/dokumente/N-118909.html