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Benchmark of rigorous methods for electromagnetic field simulations

: Burger, S.; Zschiedrich, L.; Schmidt, F.; Evanschitzky, P.; Erdmann, A.


Kawahira, H.; Zurbrick, L.S. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Photomask technology 2008 : Papers from the SPIE Conference on Photomask Technology held as part of the 28th International Symposium on Photomask Technology. 7 - 10 October 2008, Monterey, California, USA
Bellingham, WA: SPIE, 2008 (SPIE Proceedings 7122)
ISBN: 978-0-8194-7355-4
Paper 71221S
Conference on Photomask Technology <2008, Monterey/Calif.>
International Symposium on Photomask Technology <28, 2008, Monterey/Calif.>
Fraunhofer IISB ()

We have developed an interface which allows to perform rigorous electromagnetic field (EMF) simulations with the simulator JCMsuite and subsequent aerial imaging and resist simulations with the simulator Dr.LiTHO.With the combined tools we investigate the convergence of near-field and far-field results for different DUV masks. We also benchmark results obtained with the waveguide-method EMF solver included in Dr.LiTHO and with the finite-element-method EMF solver JCMsuite. We demonstrate results on convergence for dense and isolated hole arrays, for masks including diagonal structures, and for a large 3D mask pattern of lateral size 10 microns by 10 microns.