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Optical emission spectroscopy of Ni, Cr, and NiCr for DC and high power impulse magnetron sputtering (HiPIMS)
|Society of Vacuum Coaters -SVC-, Albuquerque/NM:|
Society of Vacuum Coaters. 52nd Annual Technical Conference 2009. Proceedings : May 9-14, 2009, Santa Clara, CA USA
Albuquerque: SVC, 2009
|Society of Vacuum Coaters (Annual Technical Conference) <52, 2009, Santa Clara/Calif.>|
|Fraunhofer IST ()|
In technical applications applied forces are often measured by polymer strain gauges. Unfortunately those strain gauges are also highly sensitive to humidity and temperature resulting in creep and swelling of polymers and glue. By direct application of the strain gauges onto the surface of the workpiece by physical vapour deposition process (PVD) this negative influence is avoided. As typical material for the sensoric thin film layer NiCr is well established.
Since the sensoric properties of these layers are influenced by the plasma properties, e.g., the induced power or the applied deposition technology itself (DC or HiPIMS), using High Power Impulse Magnetron Sputtering, HiPIMS, the induced peak power and current density can be significantly increased and therefore the material properties modified. For a better understanding of the influence of the used process on the plasma properties, optical emission spectroscopy was used.
In this paper the influence of the targetstoichiometric of two NiCr compounds was investigated and compared to sputtering of the single elements. Furthermore optical emission spectra were gained for both DC and HiPIMS processes for investigation on the modification of the ion content in the processes.