Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Copper oxide and copper thin films grown by ALD for seed layer applications
| Institute for Microelectronics InterConnection -IMIC-, Tampa, Fla.:
Twenty Fifth International VLSI Multilevel Inerconnection Conference (VMIC) 2008. Proceedings : October 28 - 30, 2008, Fremont Marriott Hotel, Fremont, California
Fremont, Calif., 2008
S.365 |
| International VLSI Multilevel Interconnection Conference (VMIC) <25, 2008, Fremont/Calif.> |
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| Englisch |
| Konferenzbeitrag |
| Fraunhofer ENAS ()
Fraunhofer IZM () |