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Reflectivity of Ni/C Multilayer X-Ray Mirrors in the Energy Range 8-70 keV

: Falkenberg, G; Holz, T.; Franz, H.

Deutsches Elektronen-Synchrotron -DESY-, Hamburger Synchrotronstrahlungslabor -HASYLAB-:
Hamburger Synchrotronstrahlungslabor HASYLAB. Jahresbericht 1999
Hamburg: HASYLAB, 1999
Aufsatz in Buch
Fraunhofer IWS ()
PLD; nm-Präzisionsschicht; Röntgenoptik; Multischicht; Nanomaterialien; Grenzfläche

Besides its importance for applications in XUV and soft X-ray optics, multilayer thin films are used for monochromatization in the hard X-ray regime, if high photon flux but only moderate energy resolution (DE/E ~ 10-2) is needed. The X-ray performance of a reflection multilayer depends on the contrast in the refractive index of the two layered materials and the interface quality. W/C and W/B4C multilayer deposited by sputtering techniques on Si wafer substrates turn out to become a standard for X-ray multilayer mirrors. The Frauenhofer IWS in Dresden, Germany offers an alternative to the standard with Ni/C multilayer structures deposited by Pulsed Laser Deposition. In-house characterization of the Ni/C multilayers by X-ray reflectometry using the 8.05 keV Ka radiation from a Cu-anode reveals reflectivities comparable to standard W/C multilayers, but higher energy resolution for a given d-spacing.