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Fabrication of erbium doped planar waveguides by pulsed laser deposition and laser micromachining

: Gottmann, J.; Schlaghecken, G.; Wagner, R.; Kreutz, E.W.

Ostendorf, A. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Laser micromachining for optoelectronics device fabrication : 30 October 2002, Brugge, Belgium
Bellingham, WA: SPIE, 2003 (Proceedings of SPIE 4941)
ISBN: 0-8194-4736-6
Conference "Laser Micromachining for Optoelectronics Device Fabrication" <2002, Brugge>
Fraunhofer ILT ()
pulsed laser deposition; laser micro-machining; optical waveguide; erbium doped barium titanate

Laser radiation is used both for the deposition of dielectric Er:BaTi03 thin films and for material removal to generate wave guiding structures for photonic applications. Pulsed laser deposition with KrF excimer laser radiation (wavelength 248nm, pulsed duration 20 ns) is used to grow dense, transparent amorphous or crystalline erbium doped BaTiO3 thin films.
Visible emission due to up-conversion luminescence (wavelength 528 nm and 548 nm) under excitation with diode laser radiation at a wavelength of 975 nm is investigated as a function of the erbium concentration and structural film properties.
The dielectric films are micro machined to form optical wave guiding structures using Nd:YAG laser radiation (wavelength 532 nm, pulsed duration 40 ps) and Ti:sapphire laser radiation (wavelength 810 nm, pulse duration 63 - 150 fs) by scanning the focussed laser beam relatively to the sample.