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Extreme-ultraviolet source development: a comparison of different concepts

 
: Schriever, G.; Rahe, M.; Rebhan, M.; Basting, D.; Walecki, W.J.; Lauth, H.; Lebert, R.; Bergmann, K.; Hoffmann, D.; Rosier, O.; Neff, W.; Poprawe, R.; Sauerbrey, R.; Schroerer, H.; Düsterer, S.; Ziener, C.; Nickles, P.; Stiehl, H.; Will, I.; Sandner, W.; Schahl, G.; Rudolph, D.

Kaiser, W.M. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Soft X-Ray and EUV Imaging Systems
Bellingham/Wash.: SPIE, 2000 (SPIE Proceedings Series 4146)
ISBN: 0-8194-3791-3
S.113-120
Conference on Soft X-Ray and EUV Imaging Systems <2000, San Diego/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer ILT ()

Abstract
We discuss the results of the studies of Z-pinch sources for photolithographic applications developed by Lambda Physik. We also report the results of fundamental investigations pursued by Fraunhofer-Institut fuer Lasertechnik. Friedrich- Schiller Universitat Jena, Max-Born Institut Berlin, and Gustav August Universitat Gottingen. The later efforts are supported by German government and steered by the industrial consortium led by Lambda Physik.

: http://publica.fraunhofer.de/dokumente/B-81436.html