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Precision formtesting measurement technologies for microstructures

: Pfeifer, T.; Schneefuß, K.

European Society for Precision Engineering and Nanotechnology -EUSPEN-:
3rd international EUSPEN conference. Proceedings. CD-ROM : And 4th general meeting; Eindhoven, The Netherlands, May 26th - 30th, 2002
Eindhoven, 2002
ISBN: 90-386-2883-8
European Society for Precision Engineering and Nanotechnology (International Conference) <3, 2002, Eindhoven>
Fraunhofer IPT ()
Interferometrie; großflächige Mikrostrukturprüfung

Nowadays large area microstructured surfaces can be cost-effectively produced by innovative production technologies. The task for the measurement technology is to cover the process chain during the production of these 3D-nano- and micro-structures. But measurement time and the characterization of steep slopes are the limiting factors for the measurement systems. In the following two possible approaches for solving these problems are presented. Active positioning allows the measurement of steep edges and interferometric formtesting concepts make a fast inspection of certain surfaces possible. The interferometric formtesting of prisms, spherical lens arrays or gratings are adapted to the microscopic range. Especially for the characterization of gratings, the measurement range has been extended by using multiple wavelength interferometry.