Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Review of the fundamentals of thin-film growth

 
: Kaiser, N.

:
urn:nbn:de:0011-b-736937 (911 KByte PDF)
MD5 Fingerprint: d3a958932b8a43854e52762529b1a9da
Erstellt am: 03.09.2002


Applied optics 41 (2002), Nr.16, S.3053-3060
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Englisch
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer IOF ()
thin-film growth; film structure; real structure; deposition parameter; nucleation; coalescence; thickness growth; dielectric film; Metallic films; optical property; optical film engineering; review

Abstract
The properties of a thin film of a given material depend on the film's real structure. The real structure is defined as the link between a thin film's deposition parameters and its properties. To facilitate engineering the properties of a thin film by manipulating its real structure, thin-film formation is reviewed as a process starting with nucleation followed by coalescence and subsequent thickness growth, all stages of which can be influenced by deposition parameters. The focus in this review is on dielectric and metallic films and their optical properties. In contrast to optoelectronics all these film growth possibilities for the engineering of novel optical films with extraordinary properties are just beginning to be used.

: http://publica.fraunhofer.de/dokumente/B-73693.html