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Investigation of the plasma treatment in a multistep TiN MOCVD process
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2000
Journal Article
Titel
Investigation of the plasma treatment in a multistep TiN MOCVD process
Author(s)
Riedel, S.
Schulz, S.E.
Gessner, T.
Zeitschrift
Microelectronic engineering
DOI
10.1016/S0167-9317(99)00324-X
Language
English
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Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM