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In-situ spectroscopic ellipsometry and photometry for magnetron sputter process control
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2000
Journal Article
Titel
In-situ spectroscopic ellipsometry and photometry for magnetron sputter process control
Author(s)
Vergöhl, M.
Malkolmes, N.
Matthee, T.
Bräuer, G.
Zeitschrift
Thin solid films
Konferenz
International Conference on Metallurgical Coatings and Thin Films 2000
Language
English
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP