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Comparison of structure and properties of SiOx coatings deposited by reactive pulsed magnetron sputtering (PMS) and by hollow cathode activated EB evaporation (HAD)
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2000
Journal Article
Titel
Comparison of structure and properties of SiOx coatings deposited by reactive pulsed magnetron sputtering (PMS) and by hollow cathode activated EB evaporation (HAD)
Author(s)
Zywitzki, O.
Sahm, H.
Krug, M.
Morgner, H.
Neumann, M.
Zeitschrift
Surface and coatings technology
Konferenz
International Conference on Metallurgical Coatings and Thin Films 2001
DOI
10.1016/S0257-8972(00)00975-0
Language
English
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP