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Deposition and properties of plasma polymer films made from thiophenes

 
: Kiesow, A.; Heilmann, A.

:

Thin solid films 343-344 (1999), Nr.2, S.338-341
ISSN: 0040-6090
Englisch
Zeitschriftenaufsatz
Fraunhofer IWM ()

Abstract
Thin plasma polymer films were deposited by plasma polymerisation of thiophene (C4H4S) and iodothiophene (C4H4Si) Optical emission spectroscopy (OES) was applied during film deposition to characterise the plasma at various energy input levels and various monomer partial pressures. The electrical direct current conductivity for films deposited at various preparation conditions were calculated based on current voltage relationships which were observed. The maximum conductivity of an undoped thiophene film was sigma ~ 1.3 X 10 (exp -6) omega (exp -1) cm (exp -1).

: http://publica.fraunhofer.de/dokumente/B-61879.html