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Extreme ultraviolet emission of laser-produced plasmas using a cryogenic xenon target

: Schriever, G.; Bergmann, K.; Lebert, R.


Journal of vacuum science and technology B. Microelectronics and nanometer structures 17 (1999), Nr.5, S.2058-2060 : Lit.
ISSN: 0734-211X
ISSN: 1071-1023
Fraunhofer ILT ()
laser-produced plasma

In this article we show that laser-produced plasmas using a cryogenic xenon target are emitters of pulsed broadband extreme ultraviolet radiation with an intensity maximum around 11 nm. The photon flux and conversion efficiency (CE) of this source is comparable to the emission of laser- produced plasmas of solid state targets using elements with high atomic numbers. The CE of the laser-produced xenon plasma in a 2 per cent wavelength band at the beryllium absorption k edge at 11.1 nm is about two times higher compared to the CE at the silicon absorption I edge at 12.4 nm.