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Simulation of thermal oxidation and diffusion processes by parallel PDE solver LiSS

 
: Joppich, W.; Mijalkovic, S.

:

IEEE Electron Devices Society; Japan Society of Applied Physics -JSAP-:
International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96
Tokyo: Business Center for Academic Societies Japan, 1996
ISBN: 0-7803-2745-4
ISBN: 0-7803-2746-2
S.89-90
International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) <1, 1996, Tokyo>
Englisch
Konferenzbeitrag
Fraunhofer SCAI ()

: http://publica.fraunhofer.de/dokumente/960528.html