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Diamond membranes for X-ray masks

 

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Microelectronic engineering 17 (1992), No.1-4, pp.175-179
ISSN: 0167-9317
International Conference on Microlithography: Microcircuit Engineering (ME) <17, 1991, Rome>
English
Conference Paper
Fraunhofer ISIT ()
Fraunhofer IST ()
chemical vapour deposition; Diamantfilm; diamond; diamond film; Gasphasenabscheidung; intrinsic film stress; intrinsische Schichtspannung; masks; mechanical property; mechanische Eigenschaft; Oberflächenrauhigkeit; optische Eigenschaft; plasma CVD; Röntgenlithographie; surface roughness; X-ray lithography

Abstract
Diamond's high optical transparency, high thermal conductivity, low thermal expansion coefficient, and its high Young's modulus favours it over other materials. The deposition of diamond layers was performed utilizing a plasma activated chemical vapor deposition in a substrate temperature range of 800 to 850 degrees C. The optical transparency of diamond membranes at 630 nm, determined by spectral photometry, was found to be about 38% for a 3.6 mu m thick membrane. The surface roughness of diamond layers, measured by an atomic force microscope, is about 50 nm. Further results of diamond mask blanks concerning thickness homogeneity and radiation stability are reported.

: http://publica.fraunhofer.de/documents/PX-9774.html