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Detection limits of surface contamination analysis by nitrogen-RBS

: Lang, W.; Weidhaas, J.

Surface and Interface Analysis 17 (1991), pp.357-362
ISSN: 0142-2421
Journal Article
Fraunhofer IFT; 2000 dem IZM eingegliedert
Rutherford scattering; trace element

Owing to the development of thin-film, semiconductor and clean-room technologies, there is an increasing demand for the measurement of trace elements on surfaces. Rutherford backscattering spectroscopy using nitrogen ions is a powerful tool for this purpose. For heavy elements, e.g. gold, in silicon a surface sensitivity of 10 high 10 atom cm high -2 is reached. For medium elements, e.g. As, Cr and Fe, the detection limit is at 10 high 12 atom cm high -2.