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Design and fabrication of miniaturized dielectric interference coatings

: Frank, M.; Kaiser, N.; Schallenberg, U.

Amra, C. ; European Optical Society -EOS-; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in Optical Interference Coatings : 25 - 27 May 1999, Berlin, Germany
Bellingham, Wash.: SPIE, 1999 (Europto series)
ISBN: 0-8194-3212-1
Conference on Advances in Optical Coatings <1999, Berlin>
Conference Paper
Fraunhofer IOF ()
lift-off; manufacturing technologies; micro-filters; miniaturized interference coatings; RIE-techniques

Miniaturized interference filters were designed and fabricated using three different manufacturing technologies. Applying micro-milled ceramic masks during the coating processes different arrays of interference filters with 1 mm lateral feature size were arranged on a 3-inch Si-substrate. The spectral sensitivity of receiver cells has been modified by direct coating using ion assisted deposition (IAD) at low temperature. IAD-processes also allow the application of microlithographic masks, which are removable by organic solvents after the deposition process. As an example three different miniaturized interference filters were arranged side by side with lateral filter dimensions of a few tens of microns. A combination of coating processes, microlithographic masking procedures, and reactive ion etching made it possible to arrange three different stripe filters with minimum filter features of about 5 mm side by side.