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  4. Deposition of ceramics by LPVD
 
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1992
Journal Article
Title

Deposition of ceramics by LPVD

Abstract
The laser-assisted physical vapour deposition of ceramics is reported by photon-induced removal or vaporization of ceramic targets with subsequent deposition on stainless steel or hard metals. Different deposition conditions are achieved by variation of laser radiation parameters and processing variables especially variation of the flow characteristics and the composition of the processing gas to relate processing conditions to film dimensions as well as its resultant structural and mechanical properties. The structural properties of the deposited films are investigated by scanning electron microscopy and X-ray diffraction, the chemical ones by EDX spectroscopy. The films, which are highly compact without pores, are deduced to be amorphous and nearly stoichiometric with high adhesion strength.
Author(s)
Funken, J.
Kreutz, E.W.
Krösche, M.
Sung, H.
Voss, A.
Erkens, G.
Lemmer, O.
Leyendecker, T.
Journal
Applied surface science  
DOI
10.1016/0169-4332(92)90034-U
Language
English
Fraunhofer-Institut für Lasertechnik ILT  
Keyword(s)
  • adhesion

  • application

  • ceramic

  • coating

  • vaporisation

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