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Coupled 3D process and device simulation of advanced MOSFETs

 
: Tietzel, K.; Burenkov, A.; Lorenz, J.

Meyer, K. de; Biesemans, S.:
SISPAD 98. Simulation of semiconductor processes and devices
Wien: Springer, 1998
ISBN: 3-211-83208-4
pp.255
International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) <3, 1998, Leuwen>
English
Conference Paper
Fraunhofer IIS B ( IISB) ()

: http://publica.fraunhofer.de/documents/PX-8753.html