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Controlled plasma-chemical deposition of polymer films from a liquid monomer


10th International Symposium on Plasma Chemistry '91. Vol.3. Proceedings
pp.2.3-17/1-2.3-17/6 : Abb.,Tab.,Lit.
International Symposium on Plasma Chemistry <10, 1991, Bochum>
Conference Paper
Fraunhofer IGB ()

A reaction chamber for plasma deposition, designed in view of industrial plasma processes, has been tested by plasma polymerization of tetramethoxysilane/oxygen mixtures on polycarbonate substrates. Deposition rates have been measured as a function of parameters such as total pressure, gas flows, and the substrate coordinates in relation to the electrode dimensions. The polymeric films are characterized by IR- spectroscopy, ESCA, and thickness measurements.